■ Gas Purifier removes impurities from feed gases and provides ultra-high purity gases in a stable manner.
气体纯化设备去除原料气中杂质,并稳定提供超纯气体。
■ Offer wide variety of purifier, adsorption type, cryogenic adsorption type, and Getter-type
提供各种各样的纯化、吸附型、低温吸附型及吸气型设备
Production range
生产范围
■ Catalytic Adsorption Type
催化吸附型
Gases 气体 |
N2, O2, H2, Ar, He |
Process Material 工艺材料 |
Catalyst, Adsorbent 催化剂、吸附剂 |
Operating Temp. 工作温度 |
20 ~ 300℃ |
Operating Pressure 工作压力 |
0.8 ~ 15 MPa |
Capacity 产能 |
~ 20,000 Nm3/hr |
■ He, H2 Purifier(Low Temp. Type)
He、H2纯化(低温型)
Gases 气体 |
He, H2 |
Cooling Material 冷却材料 |
LN2 液氮 |
Operating Temp. 工作温度 |
-196℃ |
Operating Pressure 工作压力 |
0.8 Mpa |
Capacity 产能 |
10 ~ 200 Nm3/hr |
优势
■ Supplied large-scale N2 purifier(20,000 Nm3/h) for LED and Semiconductor application.
为LED和半导体应用提供了大规模的N2纯化设备(20,000 Nm3/h)。
■ Design and supply large-scale N2 purifier as well as small-sized purifier(O2, N2, Ar, He, H2) with its own technology.
设计和提供大规模N2纯化设备的同时也能设计、提供拥有自主技术的小型纯化设备(O2、N2、Ar、He、H2)
业绩表
NO. 序号 |
YEAR 年份 |
CUSTOMER 顾客 |
ITEM 项目 |
SPECIFICATION 技术参数 |
REMARK 备注 |
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1 |
DAESUNG INDUSTRIAL GASES (BANWOL) 大成产业气体(BANWOL) |
N2 |
50Nm3/h, 150kg/cm2, Catalytic Adsorption Type 催化吸附型 |
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1993 | Ar |
50Nm3/h, 150kg/cm2, Catalytic Adsorption Type 催化吸附型 |
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O2 |
20Nm3/h, 150kg/cm2, Adsorption Type 吸附型 |
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2 | 1994 |
DAESUNG INDUSTRIAL GASES (DCRI) 大成产业气体(DCRI) |
Ar |
20Nm3/h, 150kg/cm2, Catalytic Adsorption Type 催化吸附型 |
|||||||
3 | 1996 |
DAESUNG INDUSTRIAL GASES (BANWOL) 大成产业气体(BANWOL) |
He |
50Nm3/h, 10kg/cm2, Low Temperature Type 低温型 |
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2000 | H2 |
50Nm3/h, 10kg/cm2, Low Temperature Type 低温型 |
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2000 | Ar |
100Nm3/h, 150kg/cm2, Catalytic Adsorption Type 催化吸附型 |
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2000 | O2 |
100Nm3/h, 150kg/cm2, Adsorption Type 吸附型 |
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4 | 2000 |
LG INNOTEK LG 伊诺特 |
N2 |
15Nm3/h, 400kg/cm2, Adsorption Type, 2sets 吸附型,2台 |
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5 |
DAESUNG INDUSTRIAL GASES (BANWOL) 大成产业气体(BANWOL) |
He |
20Nm3/h, 10kg/cm2, Low Temperature Type 低温型 |
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2001 | Ar |
50Nm3/h, 150kg/cm2, Catalytic Adsorption Type 催化吸附型 |
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O2 |
50Nm3/h, 150kg/cm2, Adsorption Type 吸附型 |
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6 |
LG Display P4 LG 显示器 P4 |
H2 |
20Nm3/h, 7.5kg/cm2, Low Temperature Type, 2sets 低温型,2台 |
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2001 | Ar |
15Nm3/h, 7.5kg/cm2, Catalytic Adsorption Type, 2sets 催化吸附型,2台 |
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O2 |
10Nm3/h, 7.5kg/cm2, Adsorption Type, 2sets 吸附型,2台 |
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7 | 2002 |
LG INNOTEK LG 伊诺特 |
N2 |
25Nm3/h, 400kg/cm2, Adsorption Type, 2sets 吸附型,2台 |
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8 | 2002 | LEPIDUS | H2 |
80Nm3/h, 7.5kg/cm2, Catalytic Adsorption Type 催化吸附型 |
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9 |
LG Display P6 LG 显示器 P6 |
H2 |
80Nm3/h, 7.5kg/cm2, Getter + Adsorption Type, 2sets 吸气+吸附型,2台 |
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He |
80Nm3/h, 7.5kg/cm2, Catalytic Adsorption Type, 2sets 催化吸附型,2台 |
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2004 | Ar |
100Nm3/h, 7.5kg/cm2, Catalytic Adsorption Type, 2sets 催化吸附型,2台 |
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O2 |
100Nm3/h, 7.5kg/cm2, Adsorption Type, 2sets 吸附型,2台 |
||||||||||
N2 |
15,000Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type, 2sets 催化吸附型,2台 |
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|
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NO. 序号 |
YEAR 年份 |
CUSTOMER 顾客 |
ITEM 项目 |
SPECIFICATION 技术参数 |
REMARK 备注 |
||||||
10 | 2004 |
Nano Feb Center (KAIST) |
N2 |
250Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type 催化吸附型 |
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O2 |
5Nm3/h, 9.9kg/cm2, Adsorption Type 吸附型 |
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H2 |
10Nm3/h, 9.9kg/cm2, Getter + Adsorption Type 吸气+吸附型 |
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Ar |
5Nm3/h, 9.9kg/cm2, Getter 吸气型 |
||||||||||
He |
5Nm3/h, 9.9kg/cm2, Getter 吸气型 |
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11 | 2005 | LG INNOTEK | N2 |
800Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type 催化吸附型 |
China | ||||||
12 | 2005 | LG Display P7 | N2 |
20,000Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type, 2sets 催化吸附型,2台 |
|||||||
O2 |
100Nm3/h, 7.5kg/cm2, Adsorption Type, 2sets 吸附型,2台 |
||||||||||
Ar |
100Nm3/h, 7.5kg/cm2, Catalytic Adsorption Type, 2sets 催化吸附型,2台 |
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13 | 2005 | The LEDs | N2 |
40Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type 催化吸附型 |
|||||||
H2 |
20Nm3/h, 9.9kg/cm2, Getter + Adsorption Type 吸气+吸附型 |
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14 | 2005 | LIG Nex1 | N2 |
15Nm3/h, 400kg/cm2, Adsorption Type 吸附型 |
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15 | 2007 | LIG Nex1 | N2 |
15Nm3/h, 400kg/cm2, Adsorption Type 吸附型 |
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16 | 2008 | LIG Nex1 | Ar |
15Nm3/h, 400kg/cm2, Adsorption Type 吸附型 |
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17 | 2008 | LG Display P8 | N2 |
20,000Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type, 2stes 催化吸附型,2台 |
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18 | 2008 | Daelim | N2 |
3,250Nm3/h, 7kg/cm2, Adsorption Type 吸附型 |
Saudi Arabia 沙特阿拉伯 |
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19 | 2009 | LIG Nex1 | N2 | 15Nm3/h, 600kg/cm2, Adsorption Type吸附型 | |||||||
20 | 2010 | The LEDs | N2 |
50Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type 催化吸附型 |
|||||||
H2 |
20Nm3/h, 9.9kg/cm2, Getter + Adsorption Type 吸气+吸附型 |
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21 | 2011 | Hansol Chemical | N2 |
50Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type 催化吸附型 |
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22 | 2013 | Daesung Gaungzhou Gases | N2 |
8,500Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type 催化吸附型 |
China | ||||||
23 | 2014 | Daesung Gaungzhou Gases | N2 | 100Nm3/h, 150kg/cm2, Adsorption Type吸附型 | China | ||||||
He | 100Nm3/h, 150kg/cm2, Adsorption Type吸附型 | ||||||||||
Ar |
100Nm3/h, 150kg/cm2, High Catalyst + Adsorption Type 高催化+吸附型 |
||||||||||
H2 |
100Nm3/h, 9.9kg/cm2, Cryogenic Adsorption Type 低温吸附型 |
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O2 |
40Nm3/h, 150kg/cm2, High Catalyst + Adsorption Type 高催化+吸附型 |
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24 | 2016 | Daesung Gaungzhou Gases | N2 |
10,000Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type 催化吸附型 |
China | ||||||
25 | 2017 | Foosung | N2 | 30Nm3/h, 9.8kg/cm2, Adsorption Type吸附型 | Korea | ||||||
26 | 2018 | Daesung Gaungzhou Gases | N2 |
20,000Nm3/h, 9.9kg/cm2, Catalytic Adsorption Type 催化吸附型 |
China |